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Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films

✍ Scribed by Watanabe, Yukio


Book ID
125490591
Publisher
AVS (American Vacuum Society)
Year
1996
Tongue
English
Weight
384 KB
Volume
14
Category
Article
ISSN
0734-2101

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