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Contrast Inversion in TEM Studies of Poly(ferrocenylsilane)-block-Poly(dimethylsiloxane) Diblock Copolymers

✍ Scribed by Yishan Wang; Neil Coombs; Ian Manners; Mitchell A. Winnik

Publisher: John Wiley and Sons
Year: 2008
Tongue: English
Weight: 519 KB
Volume: 209
Category: Article
ISSN: 1022-1352
DOI: 10.1002/macp.200800048

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✦ Synopsis

Abstract

This paper describes an unusual contrast inversion phenomenon in TEM imaging of PFS‐b‐PDMS block copolymer bulk samples. It is clearly observed especially in samples that show a lamellar morphology that the contrast inversion is accompanied by a contraction of the PDMS domains and an expansion of the Fe‐rich domains. The location of the iron‐ and silicon‐rich domains was monitored by EDX analysis. We infer that the contrast inversion was caused by electron beam radiation‐induced damage to, and possible cross‐linking of, PDMS chains. A simple way to selectively deposit metal on electron beam patterned polymer film was demonstrated.

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