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Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature

✍ Scribed by H.Y. Chan; M.P. Srinivasan; F. Benistant; K.R. Mok; Lap Chan; H.M. Jin


Book ID
108289181
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
238 KB
Volume
504
Category
Article
ISSN
0040-6090

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