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Continouos-flow leach tests of simulated high-level waste glass in synthetic basalt groundwater

โœ Scribed by Hiroshi Kamizono; Tamio Sagawa; Shingo Tashiro


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
448 KB
Volume
9
Category
Article
ISSN
0956-053X

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โœฆ Synopsis


Continuous-flow leach tests have been carried out on simulated high-level waste glass in synthetic Grande Ronde basalt groundwater at 90 ยฐC for up to 180 d. Preliminary results obtained without irradiation are described here as reference data for later comparison with those from future experiments with irradiation. The time-dependence of the concentrations of silicon is traced, and the maximum concentration at the plateau is estimated. It is concluded from the results that, above a linear flow rate of 0.1 cm/d, the normalized leach rates of silicon tend to level off at about 6/lg โ€ข cm -' ~ โ€ข d ~ which is the maximum value under the present flow conditions.


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