Contact resistivities of Al and Ti on Si measured by a self-aligned vertical Kelvin test resistor structure

✍ Scribed by Wen Luh Yang; Tan Fu Lei; Chung Len Lee

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 440 KB
• Volume: 32
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(89)90162-7