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Contact Angle, Gas Bubble Detachment, and Surface Roughness in the Anisotropic Dissolution of Si(100) in Aqueous KOH

✍ Scribed by Baum, Theo; Satherley, John; Schiffrin, David J.


Book ID
126325086
Publisher
American Chemical Society
Year
1998
Tongue
English
Weight
108 KB
Volume
14
Category
Article
ISSN
0743-7463

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