Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner

✍ Scribed by S. Partel; S. Zoppel; P. Hudek; A. Bich; U. Vogler; M. Hornung; R. Voelkel

• Book ID: 104052600
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 592 KB
• Volume: 87
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.11.171