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Conformal growth and characterization of hafnium silicate thin film by MOCVD using HTB (hafnium tertra-tert-butoxide) and TDEAS (tetrakis-diethylamino silane)

✍ Scribed by Jaehyun Kim; Kijung Yong


Book ID
106397526
Publisher
Springer US
Year
2006
Tongue
English
Weight
333 KB
Volume
18
Category
Article
ISSN
0957-4522

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