Transparent and conductive undoped zinc
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Luka, Grzegorz ;Krajewski, Tomasz ;Wachnicki, Lukasz ;Witkowski, Bartlomiej ;Lus
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Article
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2010
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John Wiley and Sons
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English
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## Abstract Atomic layer deposition (ALD) was used to fabricate transparent and conductive thin films of ZnO. Two hundredβnano metre thick ZnO films were deposited on glass substrates at low growth temperatures varied between 120 and 240βΒ°C. As zinc and oxygen precursors we used diethylzinc (DEZn)