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Conductive and transparent zinc oxide films

✍ Scribed by B. M. Ataev; A. M. Bagamadova; V. V. Mamedov; A. K. Omaev; M. R. Rabadanov


Book ID
110666673
Publisher
SP MAIK Nauka/Interperiodica
Year
2000
Tongue
English
Weight
431 KB
Volume
36
Category
Article
ISSN
0020-1685

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## Abstract Atomic layer deposition (ALD) was used to fabricate transparent and conductive thin films of ZnO. Two hundred‐nano metre thick ZnO films were deposited on glass substrates at low growth temperatures varied between 120 and 240 °C. As zinc and oxygen precursors we used diethylzinc (DEZn)