A New Approach to Hybrid Polymer–Metal a
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J. Zhang; N. Coombs; E. Kumacheva; Y. Lin; E.H. Sargent
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Article
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2002
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John Wiley and Sons
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English
⚖ 154 KB
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130 nm, ~20 X & ±1 ) and SiO 2 (~15 nm) films. The deposition was performed by RF sputtering in 2.5 deposition cycles (1 cycle » 0.8 lm) at a deposition rate of 1.5 nm s ±1 and a pressure below 1.0 10 ±5 torr. Aluminum anodization was carried out in a 10 % phosphoric acid solution at 130 V and 7 C.