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Comprehensive modeling of ion-implant amorphization in silicon

✍ Scribed by K.R.C. Mok; M. Jaraiz; I. Martin-Bragado; J.E. Rubio; P. Castrillo; R. Pinacho; M.P. Srinivasan; F. Benistant

No coin nor oath required. For personal study only.

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