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Composites of Higher Manganese Silicides and Nanostructured Secondary Phases and Their Thermoelectric Properties

✍ Scribed by A. J. Zhou; X. B. Zhao; T. J. Zhu; Y. Q. Cao; C. Stiewe; R. Hassdorf; E. Mueller

Book ID
107455490
Publisher
Springer US
Year
2009
Tongue
English
Weight
445 KB
Volume
38
Category
Article
ISSN
0361-5235

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## Abstract Higher manganese silicide (MnSi~1.7~) films are prepared on silicon and thermally oxidized silicon substrates by reactive deposition and solid phase reaction. By co‐evaporation of manganese and silicon atoms on silicon substrate at about 400 Β°C, a sharp film‐substrate interface is obtai