Composite TiSi2/n + poly-Si low-resistivity gate electrode and interconnect for VLSI device technology

✍ Scribed by Wang, K.L.; Holloway, T.C.; Pinizzotto, R.F.; Sobczak, Z.P.; Hunter, W.R.; Tasch, A.F., Jr.

• Book ID: 114594055
• Publisher: IEEE
• Year: 1982
• Tongue: English
• Weight: 761 KB
• Volume: 29
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1982.20741