Comparison of the long time stability of some SiCxOy: H films and related compounds with respect to postdeposition incorporation of OH groups

✍ Scribed by J. Bartella; U. Herwig

• Book ID: 112290709
• Publisher: Springer
• Year: 1993
• Tongue: English
• Weight: 355 KB
• Volume: 346
• Category: Article
• ISSN: 1618-2650
• DOI: 10.1007/bf00321448