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Comparison of SiO2-based double passivation scheme by e-beam evaporation and PECVD for surface passivation and gate oxide in AlGaN/GaN HEMTs

✍ Scribed by Wang, Cong; Cho, Sung-Jin; Kim, Nam-Young


Book ID
120379569
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
1006 KB
Volume
109
Category
Article
ISSN
0167-9317

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