Comparison of residual stress in deep boron diffused silicon (100), (110) and (111) wafers

✍ Scribed by Dutta, Shankar; Saxena, Geeta; Shaveta, ; Jindal, Kajal; Pal, Ramjay; Gupta, Vinay; Chatterjee, Ratnamala

• Book ID: 122013170
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 465 KB
• Volume: 100
• Category: Article
• ISSN: 0167-577X
• DOI: 10.1016/j.matlet.2013.02.110