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Comparison of gate-induced drain leakage and charge pumping measurements for determining lateral interface trap profiles in electrically stressed MOSFETs

✍ Scribed by Okhonin, S.; Hessler, T.; Dutoit, M.


Book ID
114536430
Publisher
IEEE
Year
1996
Tongue
English
Weight
773 KB
Volume
43
Category
Article
ISSN
0018-9383

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