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Comparison of gas-phase reactions in low-temperature growth of Si films by photochemical vapor deposition and the hot wire cell method

✍ Scribed by Katsuya Abe; Takeshi Tsushima; Mitsuru Ichikawa; Akira Yamada; Makoto Konagai


Book ID
117150280
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
151 KB
Volume
266-269
Category
Article
ISSN
0022-3093

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