Comparison of ECR plasma pretreatment techniques for ZnO atomic layer epitaxy on the sapphire substrate

✍ Scribed by Kyoungchul Shin; Chongmu Lee

• Publisher: John Wiley and Sons
• Year: 2004
• Tongue: English
• Weight: 160 KB
• Volume: 1
• Category: Article
• ISSN: 1862-6351
• DOI: 10.1002/pssc.200405074