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Comparison between surface channel PMOS transistors processed with optical and X-ray lithography with regard to X-ray damage

โœ Scribed by D. Friedrich; H. Bernt; A. Kaatz; F. Naumann; L. Schmidt; W. Windbracke


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
265 KB
Volume
11
Category
Article
ISSN
0167-9317

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