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Comparative XPS and SIMS depth profile analysis of Cu-implanted silicon: evidence of segregation effects

✍ Scribed by E. Darque-Ceretti; M. Aucouturier


Book ID
113281026
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
478 KB
Volume
52
Category
Article
ISSN
0168-583X

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