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Comparative study of tunneling currents through silicon dioxide and high-κ dielectric hafnium oxide partly embedded with nanocrystals and nanotubes in metal oxide semiconductor structures

✍ Scribed by Chakraborty, Gargi; Sarkar, C. K.


Book ID
115481156
Publisher
American Institute of Physics
Year
2008
Tongue
English
Weight
505 KB
Volume
104
Category
Article
ISSN
0021-8979

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