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Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators

✍ Scribed by J. Kretz; L. Dreeskornfeld; G. Ilicali; T. Lutz; W. Weber


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
275 KB
Volume
78-79
Category
Article
ISSN
0167-9317

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