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Comparative study of anneal-induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures

✍ Scribed by Jacobsohn, L.G.; Prioli, R.; Freire, F.L.; Mariotto, G.; Lacerda, M.M.; Chung, Y.W.


Book ID
121961779
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
136 KB
Volume
9
Category
Article
ISSN
0925-9635

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