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Comment, on "A 1/f noise technique to extract the oxide trap density near the conduction band edge of silicon" [with reply]

✍ Scribed by Surya, C.; Hsiang, T.Y.; Gross, B.J.; Jayaraman, R.; Sodini, C.G.


Book ID
114535023
Publisher
IEEE
Year
1993
Tongue
English
Weight
227 KB
Volume
40
Category
Article
ISSN
0018-9383

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