Combining HRTEM–EELS nano-analysis with capacitance–voltage measurements to evaluate high-κ thin films deposited on Si and Ge as candidate for future gate dielectrics

✍ Scribed by S. Schamm-Chardon; P.E. Coulon; L. Lamagna; C. Wiemer; S. Baldovino; M. Fanciulli

• Book ID: 118486081
• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 433 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.10.012