Co-sputtering yttrium into hafnium oxide thin films to produce ferroelectric properties

✍ Scribed by Olsen, T.; Schröder, U.; Müller, S.; Krause, A.; Martin, D.; Singh, A.; Müller, J.; Geidel, M.; Mikolajick, T.

• Book ID: 120168738
• Publisher: American Institute of Physics
• Year: 2012
• Tongue: English
• Weight: 859 KB
• Volume: 101
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.4747209