CO gas sensor devices plasma-polymerized from tetramethyltin
โ Scribed by N. Inagaki; S. Tasaka; T. Mase
- Publisher
- John Wiley and Sons
- Year
- 1989
- Tongue
- English
- Weight
- 487 KB
- Volume
- 37
- Category
- Article
- ISSN
- 0021-8995
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โฆ Synopsis
Thin films plasma-polymerized from tetramethyltin was applied for CO gas sensor device. The films formed from tetramethyltin contains alkyl chains with organic tin moieties, and pyrolysis of them at 350-500ยฐC yields carbonized films with SnO, moieties. The electrical resistance for the films pyrolized at 350-500ยฐC decreases in exposing to CO gas. The sensitivity, the ratio of the electrical resistance between in air and in CO atmasphere, is enhanced by catalytic actions of palladium chloride, specially in operation at low temperatures below 50ยฐC. The gas sensitivity between CO and other gases such as ethanol, methane, and propane gases is good. The possible determination of CO gas concentration by the sensor device is in ranges from 10 to loo0 ppm.
๐ SIMILAR VOLUMES
To prepare silicon oxide (SiOx)-deposited poly(ethylene terephthalate) films with high oxygen gas barrier capability, SiOx deposition by plasma polymerization has been investigated from the viewpoint of chemical composition. Tetramethoxysilane (TMOS) is suitable as a starting material for the synthe