✦ LIBER ✦
Chlorine incorporation in silicon films deposited by low-pressure rf discharges in gas mixtures of SiCl4+H2+Ar
✍ Scribed by R. Manory; A. Grill; R. Avni
- Publisher
- Springer
- Year
- 1984
- Tongue
- English
- Weight
- 421 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0272-4324
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