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Chlorine assisted selective area epitaxy in AP-MOVPE of InP: influence of CCl4 on growth and on Zn and Si incorporation

✍ Scribed by V. Härle; B. Rose; D. Robein; Y. Gao; E. Landsbeck; F. Scholz


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
460 KB
Volume
124
Category
Article
ISSN
0022-0248

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