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Chlorination and vaporization of GeO2 component in SiO2:GeO2 porous preform in dehydration process by VAD method and spontaneous formation of SiO2 cladding layer during the dehydration by selective vaporization of GeO2

✍ Scribed by K. Sanada; T. Moriyama; K. Inada


Book ID
115990681
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
681 KB
Volume
194
Category
Article
ISSN
0022-3093

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