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ChemInform Abstract: Use of SiBN and SiBON Films Prepared by Plasma Enhanced Chemical Vapor Deposition from Borazine as Interconnection Dielectrics.
✍ Scribed by W. F. KANE; S. A. COHEN; J. P. HUMMEL; B. LUTHER; D. B. BEACH
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 29 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0931-7597
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