ChemInform Abstract: Simultaneous Oxide and Metal Removal from Silicon Surfaces.

✍ Scribed by E. A. Robertson III; S. E. Beck; M. A. George; D. A. Bohling; J. L. Waskiewicz

• Publisher: John Wiley and Sons
• Year: 2010
• Weight: 33 KB
• Volume: 30
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.199919269

✦ Synopsis

Simultaneous Oxide and Metal Removal from Silicon Surfaces.

-The first attempt to combine metal removal with bulk oxide removal in a single cleaning step is reported. The process combines 2,2,6,6-tetramethyl-3,5heptanedione with anhydrous HF in the vapor phase to remove bulk oxide and metals like Fe, Cu, Zn, and Ni. The maximum measured oxide removal is about 45 Å/min for dry thermal SiO 2 oxide at reaction conditions of 500 torr pressure and 100 • C wafer surface temperature. The surface metal concentration is reduced by three orders of magnitude. -(ROBERTSON III, E. A.; BECK,