ChemInform Abstract: Properties and Application Feasibility of an Osmium-Oxygen Thin Film Prepared by DC-Glow-Discharge Deposition from Osmium Tetraoxide.
✍ Scribed by Hitoshi Inoue; Kazuyuki Satoh
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 34 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0931-7597
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✦ Synopsis
Properties and Application Feasibility of an Osmium-Oxygen Thin Film Prepared by DC-Glow-Discharge Deposition from Osmium Tetraoxide.
-The prepared WOx films have a homogeneous amorphous structure and a resistivity in the order of 10 -4 Ωcm. The transparency of a 20 nm thick film is about 80% for visible light and allows the usage of the films on glass or plastic substrates. The film contains 30 at.% Os and 70 at.% oxygen, which makes the film easily etched by an O 2 -plasma, or be electrically oxidized. It is expected that the films can be used as micro-electrodes or micro-wiring materials. -(INOUE, HITOSHI; SATOH, KAZUYUKI; Bull.