ChemInform Abstract: New Method of Purification of HF Chemicals for Very Large Scale Integration (VLSI) Manufacturing.

✍ Scribed by K. YAMAMOTO; T. SHIMONO; T. OKADA; Y. KAWAZAWA; T. TATSUNO

• Publisher: John Wiley and Sons
• Year: 2010
• Weight: 30 KB
• Volume: 28
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.199714216

✦ Synopsis

1997 separation and purification methods, chromatography separation and purification methods, chromatography V 0200

14 -216

New Method of Purification of HF Chemicals for Very Large Scale Integration (VLSI) Manufacturing.

-Metallic impurities (e.g. Cu) in HF chemicals used in VLSI fabrication degrade the device characteristics. They can be removed by a new method using granular polysilicon (poly-Si) as adsorbent. The Cu removal efficiency of this adsorbent can be improved by an Au deposited poly-Si (Au-poly-Si) which, however, causes Au contamination of the HF. A new Au-removed Au-poly-Si adsorbent, prepared by immersion of Au-poly-Si in aqua regia at 60 • C, exhibits a Cu removal efficiency quite similar to that of Au-poly-Si. The new method, which is more promising for HF than for buffered HF, increases the HF lifetime and, therefore, reduces the amount of HF required for VLSI manufacturing. -(YAMAMOTO, K.