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ChemInform Abstract: Electrochemical Evidence of a Copper-Induced Etching of n-Type Si in Dilute Hydrofluoric Acid Solutions.

✍ Scribed by L. F. O. MARTINS; L. SELIGMAN; S. G. SANTOS FILHO; P. C. T. D'AJELLO; C. M. HASENACK; A. A. PASA


Publisher
John Wiley and Sons
Year
2010
Weight
27 KB
Volume
28
Category
Article
ISSN
0931-7597

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