Silicon alloying of TiN has been performed by CVD from TiCl 4 -SiH 2 Cl 2 -NH 3 or N 2 -H 2 at temperatures between 850 °C and 1100 °C. With ammonia, only triphased coatings have been deposited, corresponding to TiSi 2 -Ti 5 Si 3 (N)-TiN and TiSi 2 -a Si 3 N 4 -TiN mixtures. With nitrogen, the incor
ChemInform Abstract: Elaboration and Properties of CVD Ti—N—Si Coatings.
✍ Scribed by Georges Llauro; Roger Hillel; Francois Sibieude
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 30 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0931-7597
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## Abstract ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 200 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable v
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