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ChemInform Abstract: Chemistry of Organosilicon Compounds. Part 356. Molecular Structure and Photochemical Reactions of Trimethylsilylmethyl-Substituted Masked Disilene.

✍ Scribed by T. HOSHI; R. SHIMADA; C. KABUTO; T. SANJI; H. SAKURAI

Publisher: John Wiley and Sons
Year: 2010
Weight: 32 KB
Volume: 29
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199840184

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✦ Synopsis

Chemistry of Organosilicon Compounds. Part 356. Molecular Structure and Photochemical Reactions of Trimethylsilylmethyl-Substituted Masked Disilene.

-The new masked disilene (III) is prepared and the regioselectivity of its addition reactions with phenols via disilene (V) is discussed. The molecular structure of (III) is determined by single crystal X-ray diffraction. -(HOSHI, T.;

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