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Chemical vapor deposition in high-density low-pressure plasmas: reactor scale-up and performance

✍ Scribed by J. Pelletier; T. Lagarde

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 688 KB
Volume: 241
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)90433-2

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