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Chemical vapor deposition and homogeneous nucleation in monosilane pyrolysis within interparticle spaces -application of fines formation analysis to fluidized bed CVD-

✍ Scribed by Takehiko Furusawa; Toshinori Kojima; Hiroyuki Hiroha


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
566 KB
Volume
43
Category
Article
ISSN
0009-2509

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✦ Synopsis


The rate of silane pyrolysis was measured over the temperature ranging from 823K to 973K and over a relatively wide range of monosilane and hydrogen concentrations in quartz tube reactors with and without seed silicon particles. The homogeneous nucleation rate and heterogeneous CVD rate were separately evaluated and formulated as functions of temperature, and silane and hydrogen concentrations. The previously reported experimental observation of fines formation within fluidized bed CVD reactor was