Chemical etching orientation of ZnGeP2 single crystals
β Scribed by Jiang Cheng; Shifu Zhu; Beijun Zhao; Baojun Chen; Zhiyu He; Qiang Fan; Ting Xu
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 946 KB
- Volume
- 318
- Category
- Article
- ISSN
- 0022-0248
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β¦ Synopsis
A chemical etching orientation method is suggested for the ZnGeP 2 crystals. Several polished faces of ZnGeP 2 crystals were etched in a certain etching solution. Some regular etch pits appeared on all samples. The indices of side facets of the etch pits were measured by X-ray rocking method, which mainly belong to {2 0 4}, {1 1 2} and {1 1 0}. Then the three crystallographic axes of the crystals were determined according to the angle relationship. Finally, optical parametric oscillator (OPO) devices were cut at the direction of yΒΌ01 and jΒΌ531.
π SIMILAR VOLUMES
A high quality ZnGeP 2 (ZGP) single crystal 22 mm in diameter and 70 mm in length was grown by a modified vertical Bridgman method. The as-grown and annealed crystals were characterized using XRD, IR spectrophotometers, positron annihilation lifetime (PAL), Hall Effect and resistivity measurements.