Chemical depth profiling on submicron regions: a combined focused ion beam/scanning electron microscope approach
✍ Scribed by Chan, D. K.; Misquitta, S. F.; Ying, J. F.; Martner, C. C.; Hermsmeier, B. D.
- Publisher
- John Wiley and Sons
- Year
- 1999
- Tongue
- English
- Weight
- 325 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0142-2421
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✦ Synopsis
The combination of focused ion beam (FIB) milling and Ðeld emission scanning electron microscopy (SEM) with x-ray energy-dispersive spectroscopy (EDS) makes possible high-spatial-resolution (AE1 lm) element-speciÐc depth proÐling. The depth proÐle resolution is controlled via the FIB to AE 5 nm sputter depths. Depth proÐles through thin-Ðlm hard disk media on NiP substrates and through similar Ðlm structures deposited on a carbon-coated substrate are presented. The high spatial resolution of the FIB/SEM depth proÐle is not necessary for blanket Ðlms, and depth proÐles through them are used to benchmark the spatial and depth resolution of the technique using a Ðeld emission SEM. Energy depth proÐles that use increasing primary electron beam voltages in the spectrometer are shown on the same samples in comparison to FIB depth proÐles. A brief overview of this technique in relation to XPS, AES and SIMS illustrates applications where FIB depth proÐling analysis o †ers some advantages.