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Charging Phenomena and Charge Compensation in AES on Metal Oxides and Silica

✍ Scribed by Guo, Hansheng; Maus-Friedrichs, W.; Kempter, V.


Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
378 KB
Volume
25
Category
Article
ISSN
0142-2421

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✦ Synopsis


Charging processes on the bulk oxides and occurring during Auger Electron Spectroscopy Al 2 O 3 , ZrO 2 SiO 2 (AES) are studied. All samples experience a negative charge-up under the following parameters : electron beam energy > 1 keV, current density > 10-2 A cm-2 and di †erent angles of incidence. The samples show strong history e †ects as a function of previous irradiation damage. For charge compensation, Environmental Auger Electron Spectroscopy with gas is applied ; several traditional methods were applied for comparison. Charging of O 2 SiO 2 and could be reduced considerably in an environmental pressure of AE5 Γ‚ 10-8 Torr. Charging of ZrO 2 O 2 Al 2

O 3 could be compensated completely in this oxygen environment. It is shown that for the compensation of the electron beam e †ects, including electron-stimulated desorption and carbon contamination of the surface, an atmosphere O 2 of 5 Γ‚ 10-8 Torr is more efficient than using an auxiliary electron gun or low-energy positive ions. It is also more efficient than an Ar environment of 1 Γ‚ 10-4 Torr.


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