Charges and defects in SiO2 films deposited by plasma-enhanced chemical vapor deposition at low temperatures : B. K. Ip, K. C. Kao and D. J. Thomson. Solid-St. Electron.34(2) 123 (1991)

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 126 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90173-5