## Abstract The electron transfer kinetics of the Fe^3+^/Fe^2+^ redox couple on the oxide covered Ti electrodes were investigated as a function of the film thickness, film stabilization, and concentration of the redox species. The oxides were formed potentiodynamically in acidic solution of pH=3 (N
Charge transfer reactions across oxide covered Titanium Electrodes
β Scribed by Dr. M. W. Khalil
- Publisher
- John Wiley and Sons
- Year
- 1992
- Tongue
- English
- Weight
- 545 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0933-5137
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β¦ Synopsis
Abstract
The kinetics of the charge transfer process of the ferroβ/ferricyanide Redox system on anodically formed titanium oxide layers is studied. The oxides were formed potentiodynamically in borate buffer solutions of pH = 8. Anodic and cathodic Tafel lines were measured at a scan rate of 1.0 mV Β· S^β1^. Oxide thickness was measured using capacitance technique at a frequency of 1.0 KHz. The log of the exchange cd, i~0~ for the Redox system was found to decrease linearly with the oxide thickness in agreement with the theoretical treatment of Heusler. Tunneling of the electron represents the main process for the charge transfer for oxides formed at potentials below O~2~βevolution. Temporary breakdown of the oxide around the O~2~βevolution potential, causes an increase of i~O~ with thickness. The reaction order was 0.8β0.85 with respect to the Redox system. The low values of the anodic transfer coefficient supports earlier results on similar nβtype semiconductor electrodes.
π SIMILAR VOLUMES
## Abstract The kinetics of HER on Ti electrodes in H~2~SO~4~ of various concentrations in the pH range of 0.24β1.88 was studied. Cathodic Tafel lines were measured potentiodynamically at a scan rate 1.0 mVs^β1^ within the H~2~ evolution potential range. Linear parallel Tafel lines of a slope of 15
Evidence is preseoted for a reversible reaction occurring within the bulk of the surface oxide She on Ti electrodes at negative poteutials. Higb frequency impedance measurements give results characteristic of a buIk phenomenon and clearly distinguish the behaviour of filmed Ti electrodes from that o
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