Charge characteristics of thin rapid thermal nitrided SiOxNy films in MIS structure

✍ Scribed by Chen Pusheng; Yang Jin

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 120 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91271-o