✦ LIBER ✦
Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
✍ Scribed by C.D. Schaper; K. El-Awady; T. Kailath; A. Tay; L.L. Lee; W.K. Ho; S.E. Fuller
- Publisher
- Springer
- Year
- 2005
- Tongue
- English
- Weight
- 274 KB
- Volume
- 80
- Category
- Article
- ISSN
- 1432-0630
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