Characterization of Zr–Si–N films deposited by cathodic vacuum arc with different N2/SiH4 flow rates

✍ Scribed by G.P. Zhang; E.W. Niu; X.Q. Wang; G.H. Lv; L. Zhou; H. Pang; J. Huang; W. Chen; S.Z. Yang

• Book ID: 116244891
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 986 KB
• Volume: 258
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2011.12.003