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Characterization of TiN films alternately treated with PVD and Cr ion implantation

✍ Scribed by K. Oda; H. Ohara; M. Tsujioka; T. Nomura


Book ID
114194392
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
408 KB
Volume
54
Category
Article
ISSN
0254-0584

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Surface modification of indium tin oxide
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NH 2 + ion implantation was performed at the energy of 80 keV with fluence of 2 Γ— 10 16 ionsβ€’cm -2 for indium tin oxide (ITO) film coated glass, and the existence of amino group on the ITO surface was verified by Fourier transform infrared (FT-IR) spectra and X-ray photoelectron spectroscopy (XPS) a