✦ LIBER ✦
Characterization of Ti diffusion in PVD deposited WTi/AlCu metallization on monocrystalline Si by means of secondary ion mass spectroscopy
✍ Scribed by M. Plappert; O. Humbel; A. Koprowski; M. Nowottnick
- Book ID
- 119326702
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 692 KB
- Volume
- 52
- Category
- Article
- ISSN
- 0026-2714
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